45-nm silicon-on-insulator CMOS technology integrating...

IBM Journal of Research and Development 2011 Vol. 55; Iss. 3

45-nm silicon-on-insulator CMOS technology integrating embedded DRAM for high-performance server and ASIC applications

Iyer, S. S., Freeman, G., Brodsky, C., Chou, A. I., Corliss, D., Jain, S. H., Lustig, N., McGahay, V., Narasimha, S., Norum, J., Nummy, K. A., Parries, P., Sankaran, S., Sheraw, C. D., Varanasi, P. R.
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Volume:
55
Year:
2011
Language:
english
DOI:
10.1147/jrd.2011.2108112
File:
PDF, 5.14 MB
english, 2011
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