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Effects of gas flow rate on the etch characteristics of a low-ksicoh film with an amorphous carbon mask in dual-frequency CF4/C4F8/Ar capacitively-coupled plasmas
Bong-Soo Kwon, Hea-Lim Lee, Nae-Eung Lee, Chang-Young Kim, Chi Kyu ChoiVolume:
62
Language:
english
DOI:
10.3938/jkps.62.67
Date:
January, 2013
File:
PDF, 346 KB
english, 2013