Plasmonic noise in silicon nanolayers

Journal of Applied Physics 2010 Vol. 107; Iss. 3

Plasmonic noise in silicon nanolayers

Pousset, J., Millithaler, J.-F., Reggiani, L., Ziade, P., Sabatini, G., Palermo, C., Varani, L., Bournel, A., Dollfus, P.
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Volume:
107
Year:
2010
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3296293
File:
PDF, 385 KB
english, 2010
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