Thermal oxidation of Si (001) single crystal implanted with...

Thermal oxidation of Si (001) single crystal implanted with Ge ions

Terrasi, A., Scalese, S., Re, M., Rimini, E., Iacona, F., Raineri, V., La Via, F., Colonna, S., Mobilio, S.
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Volume:
91
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1471942
File:
PDF, 557 KB
english, 2002
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