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Thermal oxidation of Si (001) single crystal implanted with Ge ions
Terrasi, A., Scalese, S., Re, M., Rimini, E., Iacona, F., Raineri, V., La Via, F., Colonna, S., Mobilio, S.Volume:
91
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1471942
File:
PDF, 557 KB
english, 2002