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Study of SF 6 and SF 6 /O 2 plasmas in a hollow cathode reactive ion etching reactor using Langmuir probe and optical emission spectroscopy techniques
Pessoa, R S, Tezani, L L, Maciel, H S, Petraconi, G, Massi, MVolume:
19
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/19/2/025013
Date:
April, 2010
File:
PDF, 310 KB
english, 2010