Arbitrary substrate voltage wave forms for manipulating energy distribution of bombarding ions during plasma processing
Patterson, M M, Chu, H-Y, Wendt, A EVolume:
16
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/16/2/007
Date:
May, 2007
File:
PDF, 402 KB
english, 2007