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Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films
Deng, Xin, Buriak, Jillian M., Dai, Pei-Xia, Wan, Li-Jun, Wang, DongVolume:
48
Year:
2012
Language:
english
Journal:
Chemical Communications
DOI:
10.1039/C2CC35010F
File:
PDF, 1.89 MB
english, 2012