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Silicon Trench Oxidation in Downstream of Microwave Oxygen Plasma
Takahashi, Shuuji, Shindo, HaruoVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.066201
Date:
June, 2011
File:
PDF, 679 KB
english, 2011