MIM capacitors using atomic-layer-deposited high-/spl...

IEEE Electron Device Letters 2003 / 02 Vol. 24; Iss. 2

MIM capacitors using atomic-layer-deposited high-/spl kappa/ (HfO/sub 2/)/sub 1-x/(Al/sub 2/O/sub 3/)/sub x/ dielectrics

Hang Hu,, Chunxiang Zhu,, Xiongfei Yu,, Chin, A., Li, M.F., Byung Jin Cho,, Dim-Lee Kwong,, Foo, P.D., Ming Bin Yu,, Xinye Liu,, Winkler, J.
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Volume:
24
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2002.807703
Date:
February, 2003
File:
PDF, 302 KB
english, 2003
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