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SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, CA (Sunday 3 August 2003)] Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications - EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing
Kierey, Holger, Heidemann, Klaus F., Kleemann, Bernd H., Winters, Renate, Egle, Wilhelm J., Singer, Wolfgang, Melzer, Frank, Wevers, Rutger, Antoni, Martin, Khounsary, Ali M., Dinger, Udo, Ota, KazuyaVolume:
5193
Year:
2004
Language:
english
DOI:
10.1117/12.507741
File:
PDF, 585 KB
english, 2004