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In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
Langereis, E, Heil, S B S, Knoops, H C M, Keuning, W, van de Sanden, M C M, Kessels, W M MVolume:
42
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/42/7/073001
Date:
April, 2009
File:
PDF, 1.37 MB
english, 2009