Effects of oxide traps, interface traps, and ââborder trapsââ on metal-oxide-semiconductor devices
Fleetwood, D. M., Winokur, P. S., Reber, R. A., Meisenheimer, T. L., Schwank, J. R., Shaneyfelt, M. R., Riewe, L. C.Volume:
73
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.353777
File:
PDF, 2.84 MB
english, 1993