[IEEE 2009 IEEE Bipolar/BiCMOS Circuits and Technology...

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[IEEE 2009 IEEE Bipolar/BiCMOS Circuits and Technology Meeting - BCTM - Capri, Italy (2009.10.12-2009.10.14)] 2009 IEEE Bipolar/BiCMOS Circuits and Technology Meeting - A deep trench isolation integrated in a 0.13um BiCD process technology for analog power ICs

Kitahara, H., Tsukihara, T., Sakai, M., Morioka, J., Deguchi, K., Yonemura, K., Kikuchi, T., Onoue, S., Shirai, K., Watanabe, K., Kimura, K.
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Year:
2009
Language:
english
DOI:
10.1109/BIPOL.2009.5314160
File:
PDF, 931 KB
english, 2009
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