Substrate Reactivity Effects in the Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum on Ruthenium
Tallarida, Massimo, Kukli, Kaupo, Michling, Marcel, Ritala, Mikko, Leskelä, Markku, Schmeisser, DieterVolume:
23
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm200276z
Date:
July, 2011
File:
PDF, 4.31 MB
english, 2011