Annealing Induced Dissipation of Residual Trapped Charge in...

Annealing Induced Dissipation of Residual Trapped Charge in Focused Ion Beam Processed Wide Band Gap Materials for Device Applications.

Stevens-Kalceff, MA, Gowlett, P
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Volume:
12
Language:
english
Journal:
Microscopy and Microanalysis
DOI:
10.1017/S1431927606068425
Date:
August, 2006
File:
PDF, 121 KB
english, 2006
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