Modeling of low energy-high dose arsenic diffusion in...

Modeling of low energy-high dose arsenic diffusion in silicon in the presence of clustering-induced interstitial generation

Skarlatos, D., Tsamis, C.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
102
Year:
2007
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2773695
File:
PDF, 1.18 MB
english, 2007
Conversion to is in progress
Conversion to is failed