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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Evaluating the accuracy of a calibrated rigorous physical resist model under various process and illumination conditions
Robertson, Stewart A., Kim, Byung-Sung, Choi, Woon-Hyuk, Kim, Yoo-Hyon, Biafore, John J., Smith, Mark D., Levinson, Harry J., Dusa, Mircea V.Volume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.772766
File:
PDF, 535 KB
english, 2008