SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - A systematic approach for extracting verification patterns from an OPC test mask
Kamel, Mohammad K. A., Al-Imam, Mohamed, Kato, KokoroVolume:
8441
Year:
2012
Language:
english
DOI:
10.1117/12.977202
File:
PDF, 621 KB
english, 2012