![](/img/cover-not-exists.png)
[IEEE 2009 IEEE International Reliability Physics Symposium (IRPS) - Montreal, QC, Canada (2009.04.26-2009.04.30)] 2009 IEEE International Reliability Physics Symposium - Accurate model for time-dependent dielectric breakdown of high-k metal gate stacks
Nigam, T., Kerber, A., Peumans, P.Year:
2009
Language:
english
DOI:
10.1109/IRPS.2009.5173307
File:
PDF, 833 KB
english, 2009