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Evolution of the dielectric breakdown in Co/Al[sub 2]O[sub 3]/Co junctions by annealing
Schmalhorst, J., BruÌckl, H., Justus, M., Thomas, A., Reiss, G., Vieth, M., Gieres, G., Wecker, J.Volume:
89
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1329352
File:
PDF, 313 KB
english, 2001