Computer modelling of the plasma chemistry and plasma-based...

Journal of Physics D Applied Physics 2011 / 05 Vol. 44; Iss. 17

Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials

Bogaerts, Annemie, Eckert, Maxie, Mao, Ming, Neyts, Erik
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Volume:
44
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/44/17/174030
Date:
May, 2011
File:
PDF, 761 KB
english, 2011
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