SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Source-mask optimization incorporating a physical resist model and manufacturability constraints
Mülders, Thomas, Domnenko, Vitaliy, Küchler, Bernd, Stock, Hans-Jürgen, Klostermann, Ulrich, De Bisschop, Peter, Conley, WillVolume:
8326
Year:
2012
Language:
english
DOI:
10.1117/12.914047
File:
PDF, 2.60 MB
english, 2012