In situ observation of hydrogenated amorphous silicon...

Journal of Applied Physics 1999 Vol. 85; Iss. 2

In situ observation of hydrogenated amorphous silicon surfaces in electron cyclotron resonance hydrogen plasma annealing

Nozawa, Ryoichi, Takeda, Hirohisa, Ito, Masafumi, Hori, Masaru, Goto, Toshio
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Volume:
85
Year:
1999
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.369242
File:
PDF, 397 KB
english, 1999
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