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An Ultraviolet-Curable Mold for Sub-100-nm Lithography
Choi, Se-Jin, Yoo, Pil J., Baek, Seung J., Kim, Tae W., Lee, Hong H.Volume:
126
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja048972k
Date:
June, 2004
File:
PDF, 165 KB
english, 2004