Atomic-layer-deposited Al 2 O...

Journal of Physics D Applied Physics 2007 / 02 Vol. 40; Iss. 4

Atomic-layer-deposited Al 2 O 3 -HfO 2 laminated and sandwiched dielectrics for metal–insulator–metal capacitors

Ding, Shi-Jin, Zhang, David Wei, Wang, Li-Kang
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Volume:
40
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/40/4/023
Date:
February, 2007
File:
PDF, 468 KB
english, 2007
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