SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Modeling studies on alternative EUV mask concepts for higher NA
Erdmann, Andreas, Fuehner, Tim, Evanschitzky, Peter, Neumann, Jens Timo, Ruoff, Johannes, Graeupner, Paul, Naulleau, Patrick P.Volume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2011432
File:
PDF, 1.75 MB
english, 2013