Toward the Design of a Sequential Two Photon Photoacid...

Chemistry of Materials 2008 / 12 Vol. 20; Iss. 24

Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography

O’Connor, Naphtali A., Berro, Adam J., Lancaster, Jeffrey R., Gu, Xinyu, Jockusch, Steffen, Nagai, Tomoki, Ogata, Toshiyuki, Lee, Saul, Zimmerman, Paul, Willson, C. Grant, Turro, Nicholas J.
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Volume:
20
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm802343u
Date:
December, 2008
File:
PDF, 498 KB
english, 2008
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