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Simulation and design of planarizing materials for reverse-tone step and flash imprint lithography
Chao, BrookVolume:
7
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.2896047
Date:
April, 2008
File:
PDF, 3.05 MB
english, 2008