Simulation and design of planarizing materials for...

Simulation and design of planarizing materials for reverse-tone step and flash imprint lithography

Chao, Brook
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
7
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.2896047
Date:
April, 2008
File:
PDF, 3.05 MB
english, 2008
Conversion to is in progress
Conversion to is failed