Metal CVD for microelectronic applications: An examination...

Critical Reviews in Solid State and Material Sciences 1993 / 01 Vol. 18; Iss. 2

Metal CVD for microelectronic applications: An examination of surface chemistry and kinetics

Creighton, J. Randall, Parmeter, John E.
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Volume:
18
Language:
english
Pages:
63
Journal:
Critical Reviews in Solid State and Materials Sciences
DOI:
10.1080/10408439308242560
Date:
January, 1993
File:
PDF, 4.74 MB
english, 1993
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