SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Metal-polymer nanocomposite resist: a step towards in-situ nanopatterns metallization
Abargues, R., Martinez-Marco, M. L., Rodriguez-Canto, P. J., Marques-Hueso, J., Martinez-Pastor, J. P., Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2011555
File:
PDF, 1004 KB
english, 2013