[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - CMOS scaling for the 22nm node and beyond: Device physics and technology
Kuhn, Kelin J.Year:
2011
Language:
english
DOI:
10.1109/VTSA.2011.5872206
File:
PDF, 734 KB
english, 2011