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Multi-dipolar plasmas for uniform processing: physics, design and performance
Lacoste, A, Lagarde, T, B chu, S, Arnal, Y, Pelletier, JVolume:
11
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/11/4/307
Date:
November, 2002
File:
PDF, 546 KB
english, 2002