SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Imaging budgets for EUV optics: ready for 22-nm node and beyond
Bienert, Marc, Göhnemeier, Aksel, Natt, Oliver, Lowisch, Martin, Gräupner, Paul, Heil, Tilmann, Garreis, Reiner, van Ingen Schenau, Koen, Hansen, Steve, Schellenberg, Frank M., La Fontaine, Bruno M.Volume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.814185
File:
PDF, 492 KB
english, 2009