No time to lose—high throughput screening to assess...

Nanoscale 2011 Vol. 3; Iss. 4

No time to lose—high throughput screening to assess nanomaterial safety

Damoiseaux, R., George, S., Li, M., Pokhrel, S., Ji, Z., France, B., Xia, T., Suarez, E., Rallo, R., Mädler, L., Cohen, Y., Hoek, E. M. V., Nel, A.
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Volume:
3
Year:
2011
Language:
english
Journal:
Nanoscale
DOI:
10.1039/C0NR00618A
File:
PDF, 561 KB
english, 2011
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