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Homoepitaxial growth of high quality thick diamond film with microwave plasma CVD technique
Wang, Hong-Xing, Ishigaki, Noritaka, Ohkawa, Toshiki, Kokami, Shinichi, Inoue, Hideo, Terajima, Ryuuichi, Mutoh, Katsuhiko, Kotaki, ToshiroVolume:
1282
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2011.445
Date:
January, 2011
File:
PDF, 200 KB
english, 2011