Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films
Ritala, Mikko, Leskela, Markku, Niinisto, Lauri, Haussalo, PekkaVolume:
5
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm00032a023
Date:
August, 1993
File:
PDF, 2.00 MB
english, 1993