Real-Time Monitoring in Atomic Layer Deposition of TiO...

Langmuir 2000 / 10 Vol. 16; Iss. 21

Real-Time Monitoring in Atomic Layer Deposition of TiO 2 from TiI 4 and H 2 O−H 2 O 2

Kukli, Kaupo, Aidla, Aleks, Aarik, Jaan, Schuisky, Mikael, Hårsta, Anders, Ritala, Mikko, Leskelä, Markku
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
16
Language:
english
Journal:
Langmuir
DOI:
10.1021/la0004451
Date:
October, 2000
File:
PDF, 175 KB
english, 2000
Conversion to is in progress
Conversion to is failed