[IEEE 2012 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2012.12.10-2012.12.13)] 2012 International Electron Devices Meeting - A Monte Carlo simulation of electron transport in Cu nano-interconnects: Suppression of resistance degradation due to LER/LWR
Kurusu, Takashi, Tanimoto, Hiroyoshi, Wada, Makoto, Isobayashi, Atsunobu, Kajita, Akihiro, Aoki, Nobutoshi, Toyoshima, YoshiakiYear:
2012
Language:
english
DOI:
10.1109/IEDM.2012.6479140
File:
PDF, 524 KB
english, 2012