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[IEEE 2008 2nd IEEE International Nanoelectronics Conference - Shanghai, China (2008.03.24-2008.03.27)] 2008 2nd IEEE International Nanoelectronics Conference - Fabrication, optimization and application of complementary Multiple-Gate Tunneling FETs
Fulde, M., Heigl, A., Weis, M., Wimshofer, M., Arnim, K. v., Nirschl, Th., Sterkel, M., Knoblinger, G., Hansch, W., Wachutka, G., Schmitt-Landsiedel, D.Year:
2008
Language:
english
DOI:
10.1109/INEC.2008.4585554
File:
PDF, 254 KB
english, 2008