SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Methods for benchmarking photolithography simulators: part V
Graves, Trey, Smith, Mark D., Kapasi, Sanjay H., Dusa, Mircea V., Conley, WillVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846376
File:
PDF, 231 KB
english, 2010