Structural properties of Al2O3/AlN thin film prepared by magnetron sputtering of Al in HF-activated nitrogen plasma
Dallaeva, D.S., Bilalov, B.A., Gitikchiev, M.A., Kardashova, G.D., Safaraliev, G.K., Tománek, P., Škarvada, P., Smith, S.Volume:
526
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2012.11.023
Date:
December, 2012
File:
PDF, 815 KB
english, 2012