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[IEEE 2011 Materials for Advanced Metallization (MAM) - Dresden, Germany (2011.05.8-2011.05.12)] 2011 IEEE International Interconnect Technology Conference - Strain measurement for the semiconductor industry with nm-scale resolution by dark field electron holography and nanobeam electron diffraction
Cooper, D., Beche, A., Hartmann, J.M., Carron, V., Rouviere, J-LYear:
2011
Language:
english
DOI:
10.1109/IITC.2011.5940278
File:
PDF, 5.51 MB
english, 2011