Dual Patterning of a Poly(acrylic acid) Layer by Electron-Beam and Block Copolymer Lithographies
Pearson, Anthony C., Linford, Matthew R., Harb, John N., Davis, Robert C.Volume:
29
Language:
english
Journal:
Langmuir
DOI:
10.1021/la304486x
Date:
June, 2013
File:
PDF, 878 KB
english, 2013