Impact of alcohol additives concentration on etch rate and...

Microsystem Technologies 2013 / 04 Vol. 19; Iss. 4

Impact of alcohol additives concentration on etch rate and surface morphology of (100) and (110) Si substrates etched in KOH solutions

Rola, Krzysztof P., Zubel, Irena
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Volume:
19
Language:
english
Journal:
Microsystem Technologies
DOI:
10.1007/s00542-012-1675-x
Date:
April, 2013
File:
PDF, 2.12 MB
english, 2013
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