A New Photoresist Based on Calix[4]resorcinarene Dendrimer

Chemistry of Materials 1999 / 02 Vol. 11; Iss. 2

A New Photoresist Based on Calix[4]resorcinarene Dendrimer

Haba, Osamu, Haga, Kohji, Ueda, Mitsuru, Morikawa, Osamu, Konishi, Hisatoshi
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Volume:
11
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm980654v
Date:
February, 1999
File:
PDF, 176 KB
english, 1999
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