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Poly[(cis-3-(ethanesulfonyloxy)-2-pinanyl methacrylate)-co-(tert-butyl methacrylate)] as an acid-amplifying photoresist
Sang-Wook Park, Koji Arimitsu, Kunihiro IchimuraVolume:
21
Year:
2000
Language:
english
Pages:
4
DOI:
10.1002/1521-3927(20001001)21:153.0.co;2-v
File:
PDF, 58 KB
english, 2000