Etching Properties of HfO 2 Thin Films in Cl 2 /BCl 3 /Ar Plasma
Kim, Dong-Pyo, Kim, Gwan-Ha, Woo, Jong-Chang, Yang, Xue, Um, Doo-Seung, Kim, Chang-IlVolume:
381
Language:
english
Journal:
Ferroelectrics
DOI:
10.1080/00150190902880621
Date:
June, 2009
File:
PDF, 2.48 MB
english, 2009