Atomic Layer Deposition and Properties of Silicon Oxide...

Japanese Journal of Applied Physics 2010 / 7 Vol. 49; Iss. 7

Atomic Layer Deposition and Properties of Silicon Oxide Thin Films Using Alternating Exposures to SiH 2 Cl 2 and O 3

Lee, Won-Jun, Han, Chang-Hee, Park, Jae-Kyun, Lee, Youn-Seoung, Rha, Sa-Kyun
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.071504
Date:
July, 2010
File:
PDF, 168 KB
english, 2010
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