Low-Temperature Silicon Oxide Offset Spacer Using Plasma-Enhanced Atomic Layer Deposition for High- k /Metal Gate Transistor
Murata, Tatsunori, Miyagawa, Yoshihiro, Nishida, Yukio, Yamamoto, Yoshiki, Yamashita, Tomohiro, Matsuura, Masazumi, Asai, Koyu, Miyatake, HiroshiVolume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.04DB11
Date:
April, 2010
File:
PDF, 355 KB
english, 2010