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Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
Jiang, Ying-Bing, Liu, Nanguo, Gerung, Henry, Cecchi, Joseph L., Brinker, C. JeffreyVolume:
128
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja061097d
Date:
August, 2006
File:
PDF, 408 KB
english, 2006